Gemma Rius graduated in Physics by the UAB in 2008. She was a nanolithography engineer and Ph.D. student at the Nanofabrication and NEMS Group of the IMB-CNM-CSIC on nanofabrication and integration of nanocarbon electronic devices and silicon nanomechanical devices. As a PD in Japan, she has been at Tohoku University, Toyota Technological Institute, and at Nagoya Institute of Technology as assistant professor. From December 2015, Dr. Rius was a granted as a Beatriu de Pinós postdoctoral researcher and from 2018, she is appointed as a Ramon y Cajal at the IMB-CNM-CSIC. She has more than 60 publications including some review articles, book chapters and the edition of a book in epitaxial graphene on SiC. She is involved on education and supervision of both undergraduate and graduate students, and promotes outreach and internationalization.
- Nanoelectronic devices based on carbon nanomaterials
- Synthesis and processing of graphene, carbon nanotubes/fibers, Si and ZnO nanowires, GO, block copolymers
- Integration of nanomaterials & nanostructures for devices such as batteries, supercaps, (bio)sensors, AFM probes
- Irradiation by charged beams and particles of nanomaterials and devices
- Nanopatterning by EBL, FIB, local anodic AFM lithography and (DSA) of block copolymer thin films
- Micro/nanofabrication techniques, e.g. for silicon NEMS, and their integration in CMOS circuits
- Surface & morpho/structural characterization, e.g. advanced AFM modes, TEM, Raman spect., synchrotron-based
The Institut de Microelectrònica de Barcelona - Centro Nacional de Microelectrónica (IMB-CNM, CSIC) is a public research lab for Si-based micro and nano integrated systems. The key research areas of the IMB-CNM are:
- nanofabrication and functional properties of nano-structures,
- micro and nanotechnologies,
- transducers for chemical and biochemical sensing,
- CMOS integrated circuits and systems,
- micro-nano-bio systems, and power devices and systems.
Available equipment and techniques:
The main facilities of the IMB-CNM include a fully-equipped 1500m2 clean-room, with a basic 2.5µm CMOS technology, additional equipment for Si-based nanotechnology as well as for the emerging flexible organic and large area electronics (a.k.a. printed electronics) technology. This open infrastructure is complemented by a number of supporting units (electrical characterization, encapsulation, etc.) and specialized group labs (power devices and thermal characterization, radiation detection, bio and chemical sensors...).